Zhifu Feng profile

Dr. Zhifu Feng

Young Talent, Postdoctoral Fellow

Dr. Zhifu Feng received his Ph.D. in January 2023 from the University of Ferrara in partnership with the Bruno Kessler Foundation, with a specialization in semiconductor physics and micro/nanofabrication. From October 2019 to January 2023 he developed semiconductor gas-sensor devices and carried out comprehensive materials characterization, gaining hands-on expertise with MEMS process flows—optical and e-beam lithography, thin-film deposition (sputtering, e-beam evaporation, ALD), dry/wet etching (RIE/ICP, TMAH), wafer bonding, lift-off, metallization, and packaging/assembly (wire-/flip-chip bonding, underfill, PCB integration). His characterization experience spans SEM/AFM, XRD, Raman/PL, XPS, Hall measurements, electrical IV/CV, and environmental testing with controlled temperature/humidity and calibrated gas delivery, complemented by multiphysics/device simulation using COMSOL and MATLAB. In February 2023 he joined the Italian Institute of Technology as a postdoctoral researcher, where he works on an European Space Agency-funded program focused on X-ray/gamma-ray detector fabrication and evaluation, including 3D electrodes fabrication based on MEMS technology, halid perovskite material synthesis, devices measurements. In this ESA project, his group firstly invented 3D X-ray detector with super high sensitivity.